A CAD architecture for microelectromechanical systems

Author

Maseeh, F. ; Harris, Robert ; Senturia, Stephen

Author_Institution

MIT, Cambridge, MA, USA

fYear

1990

fDate

11-14 Feb 1990

Firstpage

44

Lastpage

49

Abstract

A CAD architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised by an elementary example on the stress-induced curvature of an oxidized silicon wafer. An architecture for an object-oriented material property simulator in which material properties and their process dependence are stored and are accessed based on the specific process conditions is also presented

Keywords

CAD; electromechanical effects; finite element analysis; mechanical engineering computing; CAD architecture; finite-element tools; mask layout; microelectromechanical systems; object-oriented material property simulator; process simulation tools; stress-induced curvature; three-dimensional mechanical CAD; Analytical models; Computational modeling; Computer simulation; Material properties; Microelectromechanical systems; Object oriented modeling; Packaging; Predictive models; Silicon; Solid modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1990. Proceedings, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE

Conference_Location

Napa Valley, CA

Type

conf

DOI

10.1109/MEMSYS.1990.110246

Filename

110246