Title :
Simulation of Gas-Filled Diodes with the Vorpal Code
Author :
Stoltz, Peter ; Nieter, C. ; Cambier, J.-L.
Author_Institution :
Tech-X Corp., Boulder, CO
Abstract :
Summary form only given. Researchers are interested in rapid switching high-current diodes for applications including accelerators, microwave sources, and flat panel displays. Gas-filled diodes, such as the pseudospark, are one class of candidates for such high-current applications. To yield a better understanding of their operation, numerical simulations of these devices must include a number of physical processes: gas ionization, secondary electron emission and ion-induced electron emission, and radiation. We are enhancing the VORPAL code to model these physical effects, and we present here electromagnetic particle-in-cell (PIC) simulation results for a generic one-dimensional diode. These simulations include models of some of the processes mentioned above, as well as the effects of the self-consistent electro-magnetic fields of the particle beams. We discuss the numerical models used, including techniques to allow users to use these models from a variety of languages, including Java and C++. We examine the case of the planar diode for a variety of conditions and discuss the several physical regimes obtained in terms of analytical models. This study provides an excellent test-bed for verification and validation of both numerical and physical models
Keywords :
ionisation; particle beams; plasma diodes; plasma electromagnetic wave propagation; plasma simulation; plasma-beam interactions; secondary electron emission; C++; Java; VORPAL code; accelerators; electromagnetic particle-in-cell simulation; flat panel displays; gas ionization; gas-filled diodes; ion-induced electron emission; microwave sources; numerical simulations; particle beams; pseudospark; secondary electron emission; Diodes; Electromagnetic modeling; Electron emission; Flat panel displays; Ion accelerators; Ionization; Ionizing radiation; Microwave devices; Numerical models; Numerical simulation;
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-9300-7
DOI :
10.1109/PLASMA.2005.359084