• DocumentCode
    2566879
  • Title

    Hybrid Gas/Plasma Simulations using DSMC with the Vorpal Code

  • Author

    Nieter, C. ; Wen-Lan Wang ; Stoltz, P.H. ; Cambier, J.-L.

  • Author_Institution
    Tech-X Corp., Boulder, CO
  • fYear
    2005
  • fDate
    20-23 June 2005
  • Firstpage
    122
  • Lastpage
    122
  • Abstract
    Summary form only given. A direct simulation Monte Carlo (DSMC) method is being added to VORPAL to model dilute (large Knudsen number) gases. VORPAL is a multi-dimensional, parallel particle-in-cell (PIC) plasma simulation code that supports a variety of models for both plasma and electromagnetic fields. The addition of the DSMC capabilities will allow VORPAL to run hybrid simulations of gas/plasma mixtures using the current plasma simulation capabilities of VORPAL along with the newly added DSMC capabilities. In particular, the resulting version of VORPAL can be used in various applications, including space propulsion (plasma thrusters) and plasma manufacturing. We will present a general overview of VORPAL´s current capabilities along with a more detailed discussion of the DSMC model. VORPAL´s DSMC simulation model was built on the existing PIC model by adding a Monte-Carlo collision model and adding the capability to do ensemble averaging. Comparisons of VORPAL simulations with the well-established DSMC code MONACO will be presented. These will include simulations of 1D high speed Couette flow, 1D thermal Couette flow, and 2D high speed flow around a flat plate
  • Keywords
    Couette flow; Monte Carlo methods; external flows; plasma flow; plasma simulation; 1D thermal Couette flow; Knudsen number; MONACO code; Monte-Carlo collision model; VORPAL code; direct simulation Monte Carlo method; electromagnetic fields; ensemble averaging; flat plate; hybrid gas-plasma simulations; particle-in-cell plasma simulation; plasma manufacturing; plasma thrusters; space propulsion; Computational modeling; Computer simulation; Magnetohydrodynamics; Physics; Plasma applications; Plasma density; Plasma materials processing; Plasma simulation; Plasma sources; Plasma x-ray sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
  • Conference_Location
    Monterey, CA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-9300-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.2005.359086
  • Filename
    4198345