Inquiry the Anode Effect on Growth Thin Films on the Flat Glass in D.C Plasma Magnetron Sputtering by Hollow Cathode and Study About Optical Properties of Copper Film Sputtered on the Zinc Substrate in Different Conditions

Author

Bahadori, F. ; Mahmoudzadeh, M. ; Pourbalasi, H.R.

Author_Institution

Dept. of Plasma Phys., Middle East Tech. Univ., Ankara

fYear

2005

fDate

20-23 June 2005

Firstpage

155

Lastpage

155

Abstract

Summary form only given. The variation of anode shape is cause to changing the rate of deposition. In this paper, we compared the deposition rate of two kind of copper anode (cylindrical and disk) and then we changed the position magnetic field and studied its effect on the growth copper film in argon and nitrogen gases. Also we investigated the optical properties (by AFM and spectrophotometry) on the growth of copper film on the zinc substrate in different conditions of variation of magnetic field and changing the gases. Then we also discussed the possibility of sputtering thin films in the optimum conditions

Keywords

atomic force microscopy; copper; metallic thin films; plasma materials processing; spectrophotometry; sputter deposition; AFM; Cu; DC plasma magnetron sputtering; Zn; anode effect; flat glass; hollow cathode; optical properties; position magnetic field; spectrophotometry; thin film growth; zinc substrate; Anodes; Cathodes; Copper; Glass; Magnetic properties; Optical films; Plasma properties; Sputtering; Substrates; Zinc;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on

Conference_Location

Monterey, CA

ISSN

0730-9244

Print_ISBN

0-7803-9300-7

Type

conf

DOI

10.1109/PLASMA.2005.359151

Filename

4198410