DocumentCode :
2568475
Title :
Emittance and its Role on the Radiographic Spot in a Paraxial Diode
Author :
Short, D.J. ; Martin, P. ; McLean, James ; Cooper, G. ; Oliver, B.V.
Author_Institution :
Atomic Weapons Establ., Aldermaston
fYear :
2005
fDate :
20-23 June 2005
Firstpage :
167
Lastpage :
167
Abstract :
Summary form only given. The paraxial diode is one of several candidate diodes being investigated to meet the X-radiography requirements of the CPF at AWE. The long term requirement is to produce a 2 mm X-ray source with a dose of 1000 rads at 1 metre. The paraxial diode currently produces around 500 R @ 1 m in a 5 mm spot. To help meet the long term requirement stated above the paraxial diode is currently being studied in detail with the aid of the large-scale-plasma PIC code Lsp in order to see if improvements can be made to spot and dose. It will be shown how the concept of emittance can be used as a powerful tool in understanding the behavior of the beam as it propagates in the diode. Emittance results in degradation of an electron´s trajectory, which ultimately leads to an increased spot on the high Z, target. Previous work suggests that focal sweeping, because of time-varying net currents, is the main contributor. However, it will be demonstrated with the aid of Lsp simulations that emittance growth from non-linear focussing and foil scatter will set fundamental limits on the spot size achievable (typically 5 mm when operating at 1.1 torr air in the drift cell). Suggestions to reduce emittance and spot are presented by using a high pressure air fill ~20 torr inside the drift cell
Keywords :
plasma X-ray sources; plasma diodes; plasma nonlinear processes; plasma simulation; 1.1 torr; 5 mm; Lsp simulations; X-radiography; X-ray source; drift cell; electron trajectory; emittance; focal sweeping; foil scatter; nonlinear focussing; paraxial diode; plasma PIC code; Atomic beams; Atomic measurements; Diodes; Electron beams; Plasma sources; Plasma x-ray sources; Radiography; USA Councils; Voltage; Weapons;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
ISSN :
0730-9244
Print_ISBN :
0-7803-9300-7
Type :
conf
DOI :
10.1109/PLASMA.2005.359172
Filename :
4198431
Link To Document :
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