• DocumentCode
    2568475
  • Title

    Emittance and its Role on the Radiographic Spot in a Paraxial Diode

  • Author

    Short, D.J. ; Martin, P. ; McLean, James ; Cooper, G. ; Oliver, B.V.

  • Author_Institution
    Atomic Weapons Establ., Aldermaston
  • fYear
    2005
  • fDate
    20-23 June 2005
  • Firstpage
    167
  • Lastpage
    167
  • Abstract
    Summary form only given. The paraxial diode is one of several candidate diodes being investigated to meet the X-radiography requirements of the CPF at AWE. The long term requirement is to produce a 2 mm X-ray source with a dose of 1000 rads at 1 metre. The paraxial diode currently produces around 500 R @ 1 m in a 5 mm spot. To help meet the long term requirement stated above the paraxial diode is currently being studied in detail with the aid of the large-scale-plasma PIC code Lsp in order to see if improvements can be made to spot and dose. It will be shown how the concept of emittance can be used as a powerful tool in understanding the behavior of the beam as it propagates in the diode. Emittance results in degradation of an electron´s trajectory, which ultimately leads to an increased spot on the high Z, target. Previous work suggests that focal sweeping, because of time-varying net currents, is the main contributor. However, it will be demonstrated with the aid of Lsp simulations that emittance growth from non-linear focussing and foil scatter will set fundamental limits on the spot size achievable (typically 5 mm when operating at 1.1 torr air in the drift cell). Suggestions to reduce emittance and spot are presented by using a high pressure air fill ~20 torr inside the drift cell
  • Keywords
    plasma X-ray sources; plasma diodes; plasma nonlinear processes; plasma simulation; 1.1 torr; 5 mm; Lsp simulations; X-radiography; X-ray source; drift cell; electron trajectory; emittance; focal sweeping; foil scatter; nonlinear focussing; paraxial diode; plasma PIC code; Atomic beams; Atomic measurements; Diodes; Electron beams; Plasma sources; Plasma x-ray sources; Radiography; USA Councils; Voltage; Weapons;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
  • Conference_Location
    Monterey, CA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-9300-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.2005.359172
  • Filename
    4198431