DocumentCode
2570259
Title
Effect the Heat on the Growth Copper Film Sputtered on the Zinc Substrate in Different Conditions
Author
Bahadori, F. ; Mahmoudzadeh, M.
Author_Institution
Dept. of Plasma Phys., METU, Ankara
fYear
2005
fDate
20-23 June 2005
Firstpage
227
Lastpage
227
Abstract
Summary form only given. In this paper we investigated the effect of high temperature on the growth of copper film on the zinc substrate in different conditions of variation of magnetic field and changing the gases. Then we also discussed the possibility of sputtering thin films in the optimum conditions
Keywords
copper; metallic thin films; plasma materials processing; sputter deposition; Cu; Zn; copper film growth; high-temperature effect; magnetic field variation; thin film sputtering; zinc substrate; Argon; Atmospheric-pressure plasmas; Copper; Helium; Physics; Plasma applications; Plasma diagnostics; Plasma temperature; Substrates; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location
Monterey, CA
ISSN
0730-9244
Print_ISBN
0-7803-9300-7
Type
conf
DOI
10.1109/PLASMA.2005.359282
Filename
4198541
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