DocumentCode :
2571493
Title :
Design optimization of microwave power heterojunction bipolar transistor cells
Author :
Wang, G.W. ; Yang, L.W. ; Laird, R.W. ; Williams, D.A. ; Sadowski, J.P. ; Wright, P.D.
Author_Institution :
Ford Microelectron. Inc., Colorado Springs, CO, USA
fYear :
1989
fDate :
13-15 June 1989
Firstpage :
1061
Abstract :
Results of a design optimization study of power heterojunction bipolar transistor (HBT) cells are presented. AlGaAs-GaAs HBTs have been fabricated using a simple heterostructure design grown by molecular beam epitaxy and a novel self-aligned fabrication process which offers relatively low parasitics. The influence of power transistor cell design on device performance is emphasized. The design optimization study involved simultaneous fabrication of transistor cells with a relatively wide range of geometries. Transistors with a wide range of emitter finger sizes and number, but with the same number of collector contacts and the same basic cell design approach, have been fabricated and characterized by DC and microwave testing. The test results indicate that HBTs with more than three fingers do not exhibit a higher maximum current and that adding emitter fingers in this design merely increases the parasitic base-collector capacitance and drastically reduces f/sub T/ and f/sub MAG/. In contrast, using a similar number of longer emitter fingers yields devices with the highest maximum current density while maintaining acceptable high-frequency performance.<>
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; power transistors; solid-state microwave devices; AlGaAs-GaAs; DC performance; HBT; HF performance; III-V semiconductors; MBE; S-parameter measurements; design optimization; device geometry variation; device performance; emitter finger sizes; heterojunction bipolar transistor; high-frequency performance; microwave power transistors; molecular beam epitaxy; parasitic base-collector capacitance; power transistor cell design; self-aligned fabrication process; Design optimization; Fabrication; Fingers; Geometry; Heterojunction bipolar transistors; Microwave transistors; Molecular beam epitaxial growth; Parasitic capacitance; Power transistors; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 1989., IEEE MTT-S International
Conference_Location :
Long Beach, CA, USA
Type :
conf
DOI :
10.1109/MWSYM.1989.38905
Filename :
38905
Link To Document :
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