Title :
Development of 4×4 MEMS optical switch
Author :
Kato, Yoshichika ; Mori, Keiichi ; Mase, Takao ; Takahashi, Ayumi ; Imaki, Osamu ; Kaku, Ryoji
Author_Institution :
Central Res. Lab., Japan Aviation Electron. Ind. Ltd., Tokyo, Japan
Abstract :
We present a design and experimental results of a 4×4 matrix optical switch that is suitable for passive alignment process, in which thick photoresist technology is utilized for the fabrication of tall vertical mirrors
Keywords :
etching; micro-optics; micromachining; mirrors; optical communication equipment; optical fabrication; optical switches; photoresists; MEMS optical switch; etching; fabrication; matrix optical switch; micromachined switch; micromirrors; passive alignment process; photolithography; tall vertical mirrors; thick photoresist technology; Fasteners; Micromechanical devices; Mirrors; Optical coupling; Optical design; Optical device fabrication; Optical fibers; Optical losses; Optical switches; Resists;
Conference_Titel :
Optical MEMS, 2000 IEEE/LEOS International Conference on
Conference_Location :
Kauai, HI
Print_ISBN :
0-7803-6257-8
DOI :
10.1109/OMEMS.2000.879643
