Deep lithography with protons: a generic technology for the fabrication of refractive micro-optical modules

Author

Volckaerts, B. ; Ottevaere, H. ; Vila, A. ; Muruzabal, M. ; Debaes, C. ; Vynck, P. ; Tuteleers, P. ; Baukens, V. ; Hermanne, A. ; Veretennicoff, I. ; Thienpont, H.

Author_Institution

Dept. of Appl. Phys. & Photonics, Vrije Univ., Brussels, Belgium

fYear

2000

fDate

2000

Firstpage

103

Lastpage

104

Abstract

We present the state-of-the-art of deep lithography with protons as a candidate technology dedicated to the fabrication of 21/2D and 3D micro-opto-mechanical systems. Its concept is very similar to that of LIGA, but uses ions rather than electromagnetic radiation to structure and shape PMMA plates. We adopted the concept, thoroughly upgraded its practical implementation, turned it into a high-quality day-to-day reproducible MOMS technology and are continuously improving its performance and extending its range of practical application

Keywords

ion beam lithography; micro-optics; optical fabrication; optical polymers; rapid prototyping (industrial); PMMA plates; closed-loop positioning system; deep lithography with protons; generic fabrication technology; micro-opto-mechanical systems; rapid prototyping; refractive micro-optical modules; reproducible technology; Fabrication; Lithography; Message-oriented middleware; Microoptics; Optical arrays; Optical refraction; Optical sensors; Protons; Sensor arrays; Shape;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS, 2000 IEEE/LEOS International Conference on

Conference_Location

Kauai, HI

Print_ISBN

0-7803-6257-8

Type

conf

DOI

10.1109/OMEMS.2000.879647

Filename

879647