• DocumentCode
    2572867
  • Title

    Tri-layer a-Si:H integrated circuits on polymeric substrates

  • Author

    Thomasson, D.B. ; Bonse, M. ; Jiunn-Ru Huang ; Wronski, C.R. ; Jackson, T.N.

  • Author_Institution
    Hewlett-Packard Co., Santa Rosa, CA, USA
  • fYear
    1998
  • fDate
    6-9 Dec. 1998
  • Firstpage
    253
  • Lastpage
    256
  • Abstract
    Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 /spl mu/sec, and minimum power dissipation was less than 10 /spl mu/W per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
  • Keywords
    MOS integrated circuits; amorphous semiconductors; delays; elemental semiconductors; hydrogen; low-power electronics; silicon; thin film transistors; 10 muW; 10 mus; MOS ICs; Si:H; minimum stage delay; polyimide substrates; power dissipation; ring oscillators; thermal engineering; thermal mountant; thin film transistors; Amorphous silicon; Delay; Glass; Integrated circuit measurements; Polyimides; Polymers; Power dissipation; Power measurement; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-4774-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1998.746348
  • Filename
    746348