DocumentCode
2572867
Title
Tri-layer a-Si:H integrated circuits on polymeric substrates
Author
Thomasson, D.B. ; Bonse, M. ; Jiunn-Ru Huang ; Wronski, C.R. ; Jackson, T.N.
Author_Institution
Hewlett-Packard Co., Santa Rosa, CA, USA
fYear
1998
fDate
6-9 Dec. 1998
Firstpage
253
Lastpage
256
Abstract
Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 /spl mu/sec, and minimum power dissipation was less than 10 /spl mu/W per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
Keywords
MOS integrated circuits; amorphous semiconductors; delays; elemental semiconductors; hydrogen; low-power electronics; silicon; thin film transistors; 10 muW; 10 mus; MOS ICs; Si:H; minimum stage delay; polyimide substrates; power dissipation; ring oscillators; thermal engineering; thermal mountant; thin film transistors; Amorphous silicon; Delay; Glass; Integrated circuit measurements; Polyimides; Polymers; Power dissipation; Power measurement; Substrates; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Print_ISBN
0-7803-4774-9
Type
conf
DOI
10.1109/IEDM.1998.746348
Filename
746348
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