DocumentCode :
2572867
Title :
Tri-layer a-Si:H integrated circuits on polymeric substrates
Author :
Thomasson, D.B. ; Bonse, M. ; Jiunn-Ru Huang ; Wronski, C.R. ; Jackson, T.N.
Author_Institution :
Hewlett-Packard Co., Santa Rosa, CA, USA
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
253
Lastpage :
256
Abstract :
Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 /spl mu/sec, and minimum power dissipation was less than 10 /spl mu/W per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
Keywords :
MOS integrated circuits; amorphous semiconductors; delays; elemental semiconductors; hydrogen; low-power electronics; silicon; thin film transistors; 10 muW; 10 mus; MOS ICs; Si:H; minimum stage delay; polyimide substrates; power dissipation; ring oscillators; thermal engineering; thermal mountant; thin film transistors; Amorphous silicon; Delay; Glass; Integrated circuit measurements; Polyimides; Polymers; Power dissipation; Power measurement; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746348
Filename :
746348
Link To Document :
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