DocumentCode :
2573321
Title :
Impact of neutron flux on soft errors in MOS memories
Author :
Eto, A. ; Hidaka, M. ; Okuyama, Y. ; Kimura, K. ; Hosono, M.
Author_Institution :
Semicond. & Integrated Circuit Group, Hitachi Ltd., Tokyo, Japan
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
367
Lastpage :
370
Abstract :
Investigation of the effect of neutrons on MOS memory devices showed that such devices are sensitive to neutrons. Neutron irradiation of DRAMs and SRAMs caused bit errors due to soft errors; however, no errors occurred in FRAMs and flash memories. The irradiation of alpha-rays caused only single-bit-errors, but when neutrons were irradiated, both single-bit-errors and adjacent multi-bit-errors (about 5% of the total) occurred on our results. Soft errors in RAM were estimated not to occur when the energy of the neutron particles is about 5 MeV or less. Two tendencies were identified between the error rate and the collected charge, depending on the device structures. In particular, presence of a triple-well played a significant role for lowering the error rate. Simulation using a simplified two-dimensional model produced results close to the experiment results, in terms of error mode and device configurations.
Keywords :
DRAM chips; MOS memory circuits; SRAM chips; circuit simulation; integrated circuit modelling; integrated circuit reliability; neutron effects; DRAMs; MOS memories; SRAMs; adjacent multi-bit-errors; collected charge; device configurations; error mode; error rate; neutron flux; single-bit-errors; soft errors; triple-well; two-dimensional model; Earth; Error analysis; Ferroelectric films; Flash memory; Neutrons; Nonvolatile memory; Performance evaluation; Polyethylene; Power cables; Random access memory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746376
Filename :
746376
Link To Document :
بازگشت