DocumentCode :
2573344
Title :
Measurement of Plasma Density and Conductivity by Langmuir and R.F Probe in Different Conditions and Comparison with Theory
Author :
Bahadori, F. ; Yaserian, K. ; Mahmoudzadeh, M.
Author_Institution :
Dept. of Plasma Phys., METU, Ankara
fYear :
2005
fDate :
20-23 June 2005
Firstpage :
323
Lastpage :
323
Abstract :
Summary form only given. We are currently performing experiments to measure the density and conductivity of plasma in an optimum pressure and magnetic field discharge. The plasma density and conductivity measured by RF and Langmuir probes and we expect to present the result obtained for plasma density and conductivity in argon, nitrogen and oxygen discharge. And then the obtained result compared with theorem. We will also discuss the possibility of sputtering thin films in the optimum conditions.
Keywords :
Langmuir probes; argon; nitrogen; oxygen; plasma density; plasma materials processing; plasma transport processes; sputter deposition; Ar; Langmuir probe; N2; O2; RF probe; magnetic field discharge; plasma conductivity; plasma density; sputtering thin films; Conductivity measurement; Current measurement; Density measurement; Magnetic field measurement; Performance evaluation; Plasma density; Plasma measurements; Pressure measurement; Probes; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2005. ICOPS '05. IEEE Conference Record - Abstracts. IEEE International Conference on
Conference_Location :
Monterey, CA
ISSN :
0730-9244
Print_ISBN :
0-7803-9300-7
Type :
conf
DOI :
10.1109/PLASMA.2005.359461
Filename :
4198720
Link To Document :
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