Novel thermal microactuator based on CVD-diamond films

Author

Gluche, P. ; Leuner, R. ; Kohn, E. ; Rembe, C. ; Aus der Wiesche, S. ; Hofer, E.P.

Author_Institution

Dept. of Electron. Devices & Circuits, Ulm Univ., Germany

fYear

1998

fDate

6-9 Dec. 1998

Firstpage

483

Lastpage

486

Abstract

Thermal microactuators offer a large potential for technical applications such as inkjet print heads, micro drop valves, micro pumps or chemical micro reactors. However, the enormous mechanical and thermal stress limits the device reliability and efficiency. In order to overcome complex technologies and reliability problems, we present the first thermal diamond microactuator, enabling superheating of various liquids, highly reproducible drop ejection with high reliability and a fabrication technology of low complexity.

Keywords

chemical vapour deposition; diamond; elemental semiconductors; internal stresses; microactuators; semiconductor device reliability; thermal stresses; C; CVD films; chemical micro reactors; device efficiency; device reliability; drop ejection; fabrication technology; inkjet print heads; mechanical stress; micro drop valves; micro pumps; superheating; thermal microactuator; thermal stress; Boron; Heating; Insulation; Liquids; Microactuators; Semiconductor films; Silicon; Substrates; Temperature dependence; Thermal stresses;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International

Conference_Location

San Francisco, CA, USA

ISSN

0163-1918

Print_ISBN

0-7803-4774-9

Type

conf

DOI

10.1109/IEDM.1998.746403

Filename

746403