Title :
Novel thermal microactuator based on CVD-diamond films
Author :
Gluche, P. ; Leuner, R. ; Kohn, E. ; Rembe, C. ; Aus der Wiesche, S. ; Hofer, E.P.
Author_Institution :
Dept. of Electron. Devices & Circuits, Ulm Univ., Germany
Abstract :
Thermal microactuators offer a large potential for technical applications such as inkjet print heads, micro drop valves, micro pumps or chemical micro reactors. However, the enormous mechanical and thermal stress limits the device reliability and efficiency. In order to overcome complex technologies and reliability problems, we present the first thermal diamond microactuator, enabling superheating of various liquids, highly reproducible drop ejection with high reliability and a fabrication technology of low complexity.
Keywords :
chemical vapour deposition; diamond; elemental semiconductors; internal stresses; microactuators; semiconductor device reliability; thermal stresses; C; CVD films; chemical micro reactors; device efficiency; device reliability; drop ejection; fabrication technology; inkjet print heads; mechanical stress; micro drop valves; micro pumps; superheating; thermal microactuator; thermal stress; Boron; Heating; Insulation; Liquids; Microactuators; Semiconductor films; Silicon; Substrates; Temperature dependence; Thermal stresses;
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-4774-9
DOI :
10.1109/IEDM.1998.746403
