Design of the Macro-Motion Table Control System for Lithography Stencil Stage Based on Disturbance Observer

In order to provide academic steering for the design of stepping and scanning lithography and settle the controlling problem of the macro-motion table for lithography stencil stage, the paper designs the macro-motion positioning system for lithography stencil stage using linear motor and establishes the mathematic model of the whole linear motion stage and puts up a control model of uncompleted differential PID + disturbance observer. Based on the same disturbance, simulation tests using MATLAB software indicate that the tracking error with common PID control method is within plusmn0.025mm and the tracking error of adopting the suggested method is only within plusmn0.015mm. So, the latter has better control performance than the former and can effectively restrain outside disturbance and owes favorable tracking performance and control effect