• DocumentCode
    2575389
  • Title

    Energy dependent electron and hole impact ionization in Si bipolar transistors

  • Author

    Palestri, P. ; Selmi, L. ; Hurkx, Godefridus Adrianus Maria ; Slotboom, J.W. ; Sangiorgi, E.

  • Author_Institution
    DIEGM, Udine, Italy
  • fYear
    1998
  • fDate
    6-9 Dec. 1998
  • Firstpage
    885
  • Lastpage
    888
  • Abstract
    This paper describes a self-consistent procedure to extract energy dependent electron (/spl alpha/) and hole (/spl beta/) ionization coefficients directly from electrical measurements of multiplication factors (M/sub n/ and M/sub p/, respectively) carried out on a single reversed junction in a bipolar device. The extracted /spl alpha/ and /spl beta/ coefficients are used to accurately calculate breakdown voltages in a variety of bipolar devices. Results point out the role of holes and of non-local hole heating on the avalanche characteristics of modern bipolar devices.
  • Keywords
    avalanche breakdown; bipolar transistors; elemental semiconductors; impact ionisation; semiconductor device breakdown; semiconductor device reliability; silicon; Si; avalanche characteristics; bipolar transistors; breakdown voltages; electron impact ionization; energy dependent impact ionization; hole impact ionization; ionization coefficients; multiplication factors; nonlocal hole heating; self-consistent procedure; single reversed junction; Bipolar transistors; Charge carrier processes; Charge measurement; Current measurement; Electric variables measurement; Electrical resistance measurement; Energy measurement; Heating; Impact ionization; Laboratories;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-4774-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1998.746496
  • Filename
    746496