Title :
Application of electron projection lithography to contacts in 65 nm node and beyond
Author :
Ikeda, J. ; Yamada, A. ; Shimizu, S. ; Hirayanagi, N. ; Suzuki, K.
Author_Institution :
Precision Equip. Co., Nikon Corp., Saitama, Japan
Abstract :
In this paper, the resist simulation and the experimental performance of EB stepper focused on application to contact hole layer are described.
Keywords :
electron beam lithography; nanocontacts; resists; semiconductor materials; semiconductor process modelling; 65 nm; EB stepper; contact hole layer; electron projection lithography; resist simulation; Acceleration; Electron beams; Electron optics; Electrooptic deflectors; Focusing; Integrated optics; Lithography; Page description languages; Resists; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268494
