DocumentCode
2576916
Title
Application of electron projection lithography to contacts in 65 nm node and beyond
Author
Ikeda, J. ; Yamada, A. ; Shimizu, S. ; Hirayanagi, N. ; Suzuki, K.
Author_Institution
Precision Equip. Co., Nikon Corp., Saitama, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
12
Lastpage
13
Abstract
In this paper, the resist simulation and the experimental performance of EB stepper focused on application to contact hole layer are described.
Keywords
electron beam lithography; nanocontacts; resists; semiconductor materials; semiconductor process modelling; 65 nm; EB stepper; contact hole layer; electron projection lithography; resist simulation; Acceleration; Electron beams; Electron optics; Electrooptic deflectors; Focusing; Integrated optics; Lithography; Page description languages; Resists; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268494
Filename
1268494
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