• DocumentCode
    2577081
  • Title

    Potentials of immersion lithography

  • Author

    Suzuki, A.

  • Author_Institution
    Opt. Technol. Res. Center, Canon Inc., Tochigi, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    30
  • Abstract
    In this paper, the development and future potential of immersion lithography are examined.
  • Keywords
    photolithography; ArF technology; immersion lithography; microlithography; Costs; Fluctuations; History; Lithography; Microscopy; Nitrogen; Optical polarization; Optical refraction; Optical variables control; Proposals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268503
  • Filename
    1268503
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2577081