DocumentCode :
2577291
Title :
New development of nanoimprint technology
Author :
Guo, L.J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
52
Abstract :
Summary form only given. In this paper, the Step-and-Flash Imprint Lithography (S-FIL), pattern replication is done non-traditionally by mechanical deforming the resist materials, which completely free itself from the resolution-limiting factors such as light diffraction or beam scattering that are often inherent with the more traditional approaches. Nanoimprint has the capability of patterning sub-10 nm structures, yet only entails simple equipment setup and easy processing. We also developed a reversed imprinting technique that allows nanopattering on flexible substrate and on non-flat surfaces, as well as the creation of 3D polymer nanostructures.
Keywords :
nanolithography; nanostructured materials; polymers; resists; 10 nm; 3D polymer nanostructures; beam scattering; flexible substrate; light diffraction; nanoimprint technology; nanopattering; pattern replication; resist materials; step-flash imprint lithography; Diffraction; Light scattering; Lithography; Nanostructures; Polymers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268514
Filename :
1268514
Link To Document :
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