DocumentCode
2577310
Title
Fabrication of accelerometer using single-step electrochemical etching for micro structures (SEEMS)
Author
Ohji, H. ; Gennissen, P.T.J. ; French, P.J. ; Tsutsumi, K.
Author_Institution
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
1999
fDate
21-21 Jan. 1999
Firstpage
61
Lastpage
65
Abstract
This paper presents a new wet etching technique for micromachining called SEEMS (Single-step Electrochemical Etching for Micro Structures). An accelerometer structure can be achieved using this SEEMS process. However, some problems which are involved in the SEEMS process had to be solved. The two main problems are: firstly, over etching can be seen at the clamping point of freestanding beam, and secondly, from the theoretical point of view, it is difficult to remove large region or to make one hole in a large area. These problems can be considerably reduced by improved mask layout and perforated mass supported by single cantilever can be achieved. Additionally, new initial pit formation is demonstrated to make structures which are free from crystal orientation of silicon substrate.
Keywords
accelerometers; elemental semiconductors; etching; micromachining; microsensors; porous semiconductors; silicon; SEEMS technique; Si; accelerometer fabrication; clamping point; freestanding beam; improved mask layout; initial pit formation; large area removal; micromachining; microstructures; over etching; perforated mass; process flow; single cantilever; single-step electrochemical etching; wet etching technique; Accelerometers; Clamps; Fabrication; Mechanical factors; Micromachining; Micromechanical devices; Research and development; Silicon; Temperature; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location
Orlando, FL, USA
ISSN
1084-6999
Print_ISBN
0-7803-5194-0
Type
conf
DOI
10.1109/MEMSYS.1999.746753
Filename
746753
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