Electrical resistivity evaluation of air-wiring formed in nano-space by focused-ion-beam chemical vapor deposition

Author

Morita, T. ; Kometani, R. ; Watanabe, K. ; Kanda, K. ; Haruyama, Y. ; Kondo, K. ; Hoshino, T. ; Kaito, T. ; Fujita, J. ; Ichihashi, T. ; Ishida, M. ; Ochiai, Y. ; Tajima, T. ; Matsui, S.

Author_Institution

Graduate Sch. of Sci., Himeji Inst. of Technol., Hyogo, Japan

fYear

2003

fDate

29-31 Oct. 2003

Firstpage

58

Lastpage

59

Abstract

In this paper, we report fabrication and electrical evaluation of various air-wirings formed by FIB-CVD. The FIB system utilizing a beam of 30 keV Ga/sup +/ ion was applied to make air-wiring. We fabricated two kinds of air-wirings. One was fabricated using two phenanthrene (C/sub 14/H/sub 10/) source gases. The other was fabricated using a mixture gas of tungsten carbonyl (W(CO)/sub 6/) and C/sub 14/H/sub 10/ source gases. Then the electrical resistivities were compared.

Keywords

chemical vapour deposition; electrical resistivity; focused ion beam technology; nanotechnology; wiring; 30 keV; FIB-CVD; air-wiring; electrical resistivity; focused-ion-beam chemical vapor deposition; nanostructures; phenanthrene source gases; tungsten carbonyl source gas; Chemical technology; Chemical vapor deposition; Electric resistance; Fabrication; Gases; Instruments; Nanoscale devices; Nanostructures; National electric code; Wiring;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-040-2

Type

conf

DOI

10.1109/IMNC.2003.1268517

Filename

1268517