Title :
Reduction in roughness of resist features in PMMA due to the absence of rinsing step
Author :
Khalid, M.N. ; Yasin, S. ; Hasko, D.G. ; Ahmed, H.
Author_Institution :
Cavendish Lab., Cambridge Univ., UK
Abstract :
In this paper, we are discussing about the effect of parameters on roughness, such as initial resist thickness, molecular weight etc.
Keywords :
dissolving; phase separation; polymer films; resists; surface roughness; PMMA; molecular weight; resist roughness; resist thickness; rinsing step; Aggregates; Laboratories; Microelectronics; Nanoelectronics; Nanofabrication; Polymers; Resists; Roads; Rough surfaces; Surface roughness;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268521
