• DocumentCode
    2577397
  • Title

    Reduction in roughness of resist features in PMMA due to the absence of rinsing step

  • Author

    Khalid, M.N. ; Yasin, S. ; Hasko, D.G. ; Ahmed, H.

  • Author_Institution
    Cavendish Lab., Cambridge Univ., UK
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    66
  • Lastpage
    67
  • Abstract
    In this paper, we are discussing about the effect of parameters on roughness, such as initial resist thickness, molecular weight etc.
  • Keywords
    dissolving; phase separation; polymer films; resists; surface roughness; PMMA; molecular weight; resist roughness; resist thickness; rinsing step; Aggregates; Laboratories; Microelectronics; Nanoelectronics; Nanofabrication; Polymers; Resists; Roads; Rough surfaces; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268521
  • Filename
    1268521
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2577397