• DocumentCode
    2577400
  • Title

    A novel micromachined magnetic-field sensor

  • Author

    Emmerich, H. ; Schofthaler, M. ; Knauss, U.

  • Author_Institution
    Autom. Equip. Div. 8, Robert Bosch GmbH, Stuttgart, Germany
  • fYear
    1999
  • fDate
    21-21 Jan. 1999
  • Firstpage
    94
  • Lastpage
    99
  • Abstract
    A novel micromachined magnetic-field sensor (MFS) using the Lorentz force is presented. Lateral displacement of surface micromachined structures is generated by the interaction of a defined current through a conducting beam and an external magnetic field. The horizontal displacement of the beam is converted into a capacitance change by comb-electrodes which form a differential capacitor. Electronic circuitry is described that measures the magnetic field by detecting the displacement of the conducting beam. If operated in vacuum at mechanical resonance, a large displacement amplitude is achieved. This magnification of the physical effect by resonant operation has been realized by a new vacuum encapsulation process. Measurements show a substantial magnification of amplitude as characterized by Q-factors above 50. First measurements with prototypes yield magnetic sensitivities of 60000 /sup V///sub A/spl middot/T/ with a detection limit in the dual digit /spl mu/T-range. With improvements in the measurement setup, lower detection limits in the single digit /spl mu/T range (that is one order of magnitude smaller than the earth´s magnetic field) are expected. Possible applications are magnetic-field measurement devices and navigation systems.
  • Keywords
    Q-factor; chemical mechanical polishing; encapsulation; etching; magnetic sensors; micromachining; micromechanical resonators; microsensors; readout electronics; CMP; Lorentz force; Q-factors; anisotropic etch; capacitance change; comb-electrodes; conducting beam; differential capacitor; horizontal displacement; large displacement amplitude; lateral displacement; magnetic sensitivity; micromachined magnetic-field sensor; navigation systems; surface micromachined structures; vacuum encapsulation; Capacitance; Capacitors; Displacement measurement; Encapsulation; Lorentz covariance; Magnetic circuits; Magnetic field measurement; Magnetic resonance; Magnetic sensors; Q factor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
  • Conference_Location
    Orlando, FL, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-5194-0
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1999.746759
  • Filename
    746759