DocumentCode
2577425
Title
Polymer screening method for chemically amplified electron beam and X-ray resists
Author
Yamamoto, H. ; Nakano, A. ; Okamoto, K. ; Kozawa, T. ; Tagawa, S.
Author_Institution
Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
70
Lastpage
71
Abstract
In this paper, we discuss the dependency of acid generation on polymer structures and a polymer screening method for the development of chemically amplified resists. Convenient screening method is expected to reduce laborious tasks for the selection of base polymers.
Keywords
X-ray lithography; electron resists; photoresists; polymer structure; polymers; X-ray resists; acid generation; chemically amplified electron beam resists; polymer screening; polymer structures; Absorption; Chemical industry; Chemical processes; Electron beams; Ionizing radiation; Optical films; Plastics industry; Polymers; Protons; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268523
Filename
1268523
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