DocumentCode :
2577615
Title :
Effect of EUV light scattering from the rough absorber and buffer side wall
Author :
Yeong-Keun Kwon ; Jun-Taek Park ; Jong-Hoi Kim ; Byung-Cheol Cha ; Seung-Wook Park ; Ilsin An ; Hye-Keun Oh
Author_Institution :
Dept. of Phys., Hanyang Univ., Ansan, South Korea
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
90
Abstract :
Summary form only given. In this paper we study the roughness of the multi-reflective surface layers by Monte-Carlo Methods and described by PSD (power spectral density) function. Surface roughness and side wall roughness are investigated and compared.
Keywords :
Monte Carlo methods; light scattering; masks; multilayers; reflectivity; surface roughness; ultraviolet radiation effects; EUV light scattering; Monte-Carlo methods; buffer side wall; multireflective surface layers; power spectral density function; rough absorber; side wall roughness; surface roughness; Light scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268533
Filename :
1268533
Link To Document :
بازگشت