DocumentCode
2577630
Title
Structural characterization of Mo/Ru/Si EUV reflector by optical modeling
Author
In-Yong Kang ; Tae Geun Kim ; Seung Yoon Lee ; Jinho Ahn ; Yong-Chae Chung
Author_Institution
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
92
Lastpage
93
Abstract
The performance of multilayer extreme ultraviolet (EUV) reflector has direct bearing on the process throughput and cost of new technology. Using measured data from the experimentally manufactured reflector, we intended, in this work, to show that the reflectivity of the Bragg reflector can be characterized by structural parameters such as d-spacing, density, and the thickness of inter-diffusion layers and oxidation layer. This quantitative analysis of the reflectivity derived from the structural parameters can be utilized to optimize the optical properties of the existing Mo/Ru/Si system as well as to provide fundamental insights into the science involved in a Bragg EUV reflector.
Keywords
chemical interdiffusion; distributed Bragg reflectors; elemental semiconductors; molybdenum; optical multilayers; oxidation; reflectivity; ruthenium; silicon; ultraviolet lithography; Bragg EUV reflector; Bragg reflector; Mo-Ru-Si; Mo/Ru/Si EUV reflector; Mo/Ru/Si system; d-spacing; density; inter-diffusion layers; multilayer extreme ultraviolet reflector; optical modeling; optical properties; oxidation layer; reflectivity; Costs; Density measurement; Manufacturing; Nonhomogeneous media; Oxidation; Reflectivity; Structural engineering; Thickness measurement; Throughput; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268534
Filename
1268534
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