• DocumentCode
    2577630
  • Title

    Structural characterization of Mo/Ru/Si EUV reflector by optical modeling

  • Author

    In-Yong Kang ; Tae Geun Kim ; Seung Yoon Lee ; Jinho Ahn ; Yong-Chae Chung

  • Author_Institution
    Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    92
  • Lastpage
    93
  • Abstract
    The performance of multilayer extreme ultraviolet (EUV) reflector has direct bearing on the process throughput and cost of new technology. Using measured data from the experimentally manufactured reflector, we intended, in this work, to show that the reflectivity of the Bragg reflector can be characterized by structural parameters such as d-spacing, density, and the thickness of inter-diffusion layers and oxidation layer. This quantitative analysis of the reflectivity derived from the structural parameters can be utilized to optimize the optical properties of the existing Mo/Ru/Si system as well as to provide fundamental insights into the science involved in a Bragg EUV reflector.
  • Keywords
    chemical interdiffusion; distributed Bragg reflectors; elemental semiconductors; molybdenum; optical multilayers; oxidation; reflectivity; ruthenium; silicon; ultraviolet lithography; Bragg EUV reflector; Bragg reflector; Mo-Ru-Si; Mo/Ru/Si EUV reflector; Mo/Ru/Si system; d-spacing; density; inter-diffusion layers; multilayer extreme ultraviolet reflector; optical modeling; optical properties; oxidation layer; reflectivity; Costs; Density measurement; Manufacturing; Nonhomogeneous media; Oxidation; Reflectivity; Structural engineering; Thickness measurement; Throughput; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268534
  • Filename
    1268534