Title :
Spot beam formation by HL-700 VSB lithography system
Author :
Morikawa, K. ; Nakamura, K. ; Kohsaka, N. ; Kubota, H.
Author_Institution :
Graduate Sch. of Sci. & Technol., Kumamoto Univ., Japan
Abstract :
Summary form only given. In this paper, we propose the new GSB shaping method by using the conventional Hitachi HL-700 VSB machine, without any special modification of the existing system. The main protocol of the beam shape conversion scheme is the switching off the beam shaping components in the electron optics, the tuning of the beam focusing conditions and the parameter change of the exposure control software.
Keywords :
electron beam lithography; electron optics; Gausian spot beam shaping method; Hitachi HL-700 variable shaped beam lithography system; beam focusing condition tuning; beam shape conversion; beam shaping components; electron optics; exposure control software; parameter change; spot beam formation; Electron beams; Fabrication; Gallium arsenide; Instruments; Lithography; Magnetic heads; Magnetic semiconductors;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268537
