Title :
Moving mask LIGA (M/sup 2/LIGA) process for control of side wall inclination
Author :
Tabata, O. ; Terasoma, K. ; Agawa, N. ; Yamamoto, K.
Author_Institution :
Ritsumeikan Univ., Kyoto, Japan
Abstract :
The side wall inclination of a PMMA microstructure fabricated by deep X-ray lithography has been controlled by moving an X-ray mask in parallel with a PMMA substrate during X-ray exposure. In order to demonstrate the feasibility of this moving mask technology, various conical shape and truncated conical shape microstructures with height of 100-300 /spl mu/m and a diameter of the top and the bottom of truncated conical structures between 0-310 /spl mu/m were fabricated.
Keywords :
LIGA; X-ray masks; micromachining; moulding; 0 to 310 micron; 100 to 300 micron; M/sup 2/LIGA process; PMMA microstructure; X-ray mask; conical shape microstructures; deep X-ray lithography; inclination angle control; moving mask LIGA; side wall inclination control; truncated conical shape microstructures; Diffraction; Fault location; Machining; Microactuators; Microstructure; Optical device fabrication; Process control; Shape; X-ray lasers; X-ray lithography;
Conference_Titel :
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location :
Orlando, FL, USA
Print_ISBN :
0-7803-5194-0
DOI :
10.1109/MEMSYS.1999.746826
