DocumentCode :
2578586
Title :
Vacuum encapsulation of resonant devices using permeable polysilicon
Author :
Lebouitz, K.S. ; Mazaheri, A. ; Howe, R.T. ; Pisano, A.P.
Author_Institution :
Berkeley Sensor & Actuator Center, California Univ., Berkeley, CA, USA
fYear :
1999
fDate :
21-21 Jan. 1999
Firstpage :
470
Lastpage :
475
Abstract :
This paper reports on a novel manufacturable, in situ vacuum micropackaging technology. Permeable polysilicon etch-access windows enable rapid removal of sacrificial material from beneath the shell (e.g., 1 mm wide shells cleared of PSG within 2 minutes) and practically eliminate internal deposition of the sealing film. Inside the vacuum encapsulation shells were lateral microresonators. These devices were selected for packaging because they are well characterized vacuum probes. Measured mechanical quality factors four months after sealing have been shown to be above 3000. These quality factors indicate a cavity pressure near 600 mTorr four months after vacuum encapsulation.
Keywords :
Q-factor; elemental semiconductors; encapsulation; micromechanical resonators; packaging; seals (stoppers); silicon; Si; etch access window; lateral microresonator; mechanical quality factor; permeable polysilicon; resonant device; sealing film; vacuum encapsulation; vacuum micropackaging; Encapsulation; Etching; Microcavities; Packaging; Probes; Pulp manufacturing; Q factor; Resonance; Sealing materials; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location :
Orlando, FL, USA
ISSN :
1084-6999
Print_ISBN :
0-7803-5194-0
Type :
conf
DOI :
10.1109/MEMSYS.1999.746874
Filename :
746874
Link To Document :
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