Title :
Advantageous exposure of X architecture pattern when using a variable shaped beam tool
Author :
Dorl, W. ; Boettcher, M. ; Eichhorn, H.-G. ; Gramss, J. ; Hahmann, P. ; Lemke, M. ; Schnabel, B. ; Weidenmueller, U.
Author_Institution :
Leica Microsyst. Lithography GmbH, Jena, Germany
Abstract :
Summary form only given. In this paper, the advantageous exposure of X architecture pattern when using a variable shaped beam tool is discussed. A X architecture pattern contains lines which represents a Manhatten pattern itself, but 45 degrees rotated additionally. To expose this kind of pattern with high throughout and high pattern fidelity is a challenging task.
Keywords :
electron beam lithography; integrated circuit interconnections; integrated circuit reliability; Manhatten pattern; X architecture pattern; chip components; electron beam lithography; high pattern fidelity; integrated circuit interconnections; integrated circuit reliability; variable shaped beam tool; Data handling; Electron beams; Lithography; Routing; Testing; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268596
