Title :
Applications of polysilanes for a negative-tone resist in ion beam lithography
Author :
Matsui, Y. ; Seki, S. ; Tsukuda, S. ; Kozawa, T. ; Tagawa, S.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki, Japan
Abstract :
In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.
Keywords :
focused ion beam technology; ion beam lithography; polymer films; resists; spin coating; FIB lithography; ion beam lithography; negative-tone resist; polysilanes; spin coating; Ion beams; Lithography; Optical polymers; Optical scattering; Pattern formation; Polymer films; Portable media players; Resists; Scanning electron microscopy; Silicon;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268598
