DocumentCode
2578619
Title
Applications of polysilanes for a negative-tone resist in ion beam lithography
Author
Matsui, Y. ; Seki, S. ; Tsukuda, S. ; Kozawa, T. ; Tagawa, S.
Author_Institution
Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
106
Lastpage
107
Abstract
In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.
Keywords
focused ion beam technology; ion beam lithography; polymer films; resists; spin coating; FIB lithography; ion beam lithography; negative-tone resist; polysilanes; spin coating; Ion beams; Lithography; Optical polymers; Optical scattering; Pattern formation; Polymer films; Portable media players; Resists; Scanning electron microscopy; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268598
Filename
1268598
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