Title :
Simulation of three-dimensional resist pattern deformation caused by surface tension using cell-shift model
Author :
Ochiai, N. ; Kotera, M.
Author_Institution :
Dept. of Electron., Inf. & Commun. Eng., Osaka Inst. of Technol., Omiya, Japan
Abstract :
In this present paper, a simulation model and the results are given to express a three dimensional resist pattern deformation caused by surface tension using a cell shift model.
Keywords :
deformation; resists; surface tension; cell-shift model; surface tension; three-dimensional resist pattern deformation; Analytical models; Deformable models; Lithography; Mechanical factors; Pattern analysis; Resists; Rough surfaces; Semiconductor device modeling; Shape; Surface tension;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268603
