DocumentCode
2578689
Title
Simulation of three-dimensional resist pattern deformation caused by surface tension using cell-shift model
Author
Ochiai, N. ; Kotera, M.
Author_Institution
Dept. of Electron., Inf. & Commun. Eng., Osaka Inst. of Technol., Omiya, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
116
Lastpage
117
Abstract
In this present paper, a simulation model and the results are given to express a three dimensional resist pattern deformation caused by surface tension using a cell shift model.
Keywords
deformation; resists; surface tension; cell-shift model; surface tension; three-dimensional resist pattern deformation; Analytical models; Deformable models; Lithography; Mechanical factors; Pattern analysis; Resists; Rough surfaces; Semiconductor device modeling; Shape; Surface tension;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268603
Filename
1268603
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