• DocumentCode
    2578709
  • Title

    Ultra high resolution hybrid lithography with negative tone chemically amplified resists

  • Author

    Landis, S. ; Pauliac, S. ; Hanawa, R. ; Suestsugu, M. ; Akita, M.

  • Author_Institution
    LETI, CEA, Grenoble, France
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    118
  • Lastpage
    119
  • Abstract
    In this paper, the development work on negative tone chemically amplified resists CARs usable in hybrid lithography and their ultimate resolution capabilities were discussed.
  • Keywords
    electron beam lithography; resists; negative tone chemically amplified resists; ultra high resolution hybrid lithography; Chemicals; Electron beams; Laboratories; Lithography; Optical arrays; Optical films; Optical sensors; Polymers; Resists; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268604
  • Filename
    1268604
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2578709