Title :
Ultra high resolution hybrid lithography with negative tone chemically amplified resists
Author :
Landis, S. ; Pauliac, S. ; Hanawa, R. ; Suestsugu, M. ; Akita, M.
Author_Institution :
LETI, CEA, Grenoble, France
Abstract :
In this paper, the development work on negative tone chemically amplified resists CARs usable in hybrid lithography and their ultimate resolution capabilities were discussed.
Keywords :
electron beam lithography; resists; negative tone chemically amplified resists; ultra high resolution hybrid lithography; Chemicals; Electron beams; Laboratories; Lithography; Optical arrays; Optical films; Optical sensors; Polymers; Resists; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268604
