Title :
Effects of ester groups on proton generation and diffusion in polymethacrylate matrices
Author :
Nakano, A. ; Okamoto, K. ; Kozawa, T. ; Tagawa, S.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki, Japan
Abstract :
In this paper, primary reaction in polymethacrylates were investigated with a pulse radiolysis method. we discuss the difference of proton generation and transfer in polymethacrylates, which is the essential property for polymethylacrylate base chemically amplified electron beam and X-ray resists.
Keywords :
X-ray lithography; diffusion; electron resists; polymers; radiolysis; X-ray resists; chemically amplified electron beam resists; diffusion; ester groups; polymethacrylate matrices; proton generation; pulse radiolysis method; Chemical lasers; Chemical products; Electromagnetic wave absorption; Lithography; Mass production; Optical films; Optical pulses; Polymers; Protons; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268605
