DocumentCode
2578794
Title
High-sensitive ultrathin electron beam resist based on Langmuir-Blodgett films of polycyanoacrylate
Author
Pisignano, D. ; Berzina, T. ; Erokhin, V. ; Fontana, M.P. ; Visconti, P. ; Cingolani, R.
Author_Institution
Nat. Nanotechnol. Lab. of INFM, Lecce Univ., Italy
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
124
Lastpage
125
Abstract
In this paper, polycyanoacrilate as ultrathin electron resist layer, testing its sensitivity and employing it as a mask for etching of metal layers were proposed.
Keywords
Langmuir-Blodgett films; electron resists; etching; masks; polymer films; sensitivity; Langmuir-Blodgett films; etching; high-sensitive ultrathin electron beam resist; mask; metal layers; polycyanoacrylate; sensitivity; Electron beams; Etching; Laboratories; Lithography; Nanotechnology; Optical films; Optical microscopy; Physics; Resists; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268607
Filename
1268607
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