Title :
Modeling Of Chemical Mechanical Polishing Process For Three-dimensional Simulation
Author :
Takahashi, H. ; Tokunaga, K. ; Kasuga, T. ; Suzuki, T.
Author_Institution :
ULSI R&D Laboratones, Semiconductor Company, Sony Corp. 4-14-1, Asahi-cho, Atsugi-shi, Japan
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623677
