DocumentCode

2578840

Title

Modeling Of Chemical Mechanical Polishing Process For Three-dimensional Simulation

Author

Takahashi, H. ; Tokunaga, K. ; Kasuga, T. ; Suzuki, T.

Author_Institution

ULSI R&D Laboratones, Semiconductor Company, Sony Corp. 4-14-1, Asahi-cho, Atsugi-shi, Japan

fYear

1997

fDate

10-12 June 1997

Firstpage

25

Lastpage

26

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

conf

DOI

10.1109/VLSIT.1997.623677

Filename

623677