Title :
Fabrication of GI structure using nanoimprint
Author :
Fujimoto, A. ; Asakawa, K.
Author_Institution :
Corp. Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
Abstract :
Fabrication of Graded-Index (GI) structure using nanoimprint was investigated. The reflectivity was measured in order to investigate the refractive prevention of GI structure.
Keywords :
nanolithography; nanotechnology; reflectivity; silicon compounds; SiO/sub 2/; graded index structure; nanoimprint; reflectivity; Electron beams; Etching; Fabrication; Glass; Nanostructures; Reflectivity; Scanning electron microscopy; Self-assembly; Substrates; Surface waves;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268612
