Title :
Status of Step and Flash Imprint Lithography tools and processes
Author :
Choi, J. ; McMackin, I. ; Schumaker, P. ; Van Nguyen ; Xu, F. ; Babbs, D. ; Sreenivasan, S.V. ; Watts, M. ; Schumaker, N.
Author_Institution :
Molecular Imprints Inc., Austin, TX, USA
Abstract :
The Step and Flash/sup TM/ Imprint Lithography (S-FIL/sup TM/) process is a step and repeat nanoreplication technique based on UV curable low viscosity liquids. This article discusses various process capability of S-FIL including imprint resolution and line edge roughness; field-to-field CD control; imprinted film thickness uniformity; process life and defect data; and overlay alignment accuracy.
Keywords :
nanolithography; ultraviolet lithography; Step and Flash Imprint Lithography; defect data; field-field CD control; imprint resolution; imprinted film thickness uniformity; line edge roughness; overlay alignment accuracy; process life; Degradation; Etching; Graphical user interfaces; Liquids; Lithography; Planarization; Surface treatment; Thickness control; Throughput; Viscosity;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268613
