Title :
Sub 100 nm lithography based on plasmon polariton resonance
Author :
Luo, Xiangang ; Ishihara, Teruya
Author_Institution :
Frontier Res. Syst., RIKEN, Wako, Japan
Abstract :
We propose a new approach named plasmon parallel nanolithography that can potentially produce sub-wavelength structures efficiently using coherent illumination of standard photoresist with ultraviolet or visible light.
Keywords :
nanolithography; photoresists; polaritons; surface plasmon resonance; ultraviolet lithography; photoresists; plasmon parallel nanolithography; plasmon polariton resonance; ultraviolet illumination; visible light illumination; Apertures; Diffraction; Lighting control; Lithography; Optical collimators; Optical polarization; Plasmons; Resists; Resonance;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268614
