DocumentCode
2578926
Title
Imprint-photo hybrid lithography with conventional contact aligner
Author
Kawata, H. ; Hirai, Y. ; Kikuta, H.
Author_Institution
Graduate Sch. of Eng., Osaka Prefecture Univ., Sakai, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
142
Lastpage
143
Abstract
A new combined-nanoimprint-and-photolithography (CNP) process is proposed. A low cost conventional aligner is used. Fine patterns up to 0.25 /spl mu/m can be fabricated by the new process.
Keywords
masks; nanolithography; photolithography; photoresists; 0.25 micron; conventional contact aligner; fine patterns; hybrid photolithography; nanoimprint; nanolithography; Cities and towns; Costs; Etching; Fabrication; Glass; Gratings; Interference; Lithography; Nanolithography; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268616
Filename
1268616
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