• DocumentCode
    2578986
  • Title

    Evaporated electron beam lithography resist for non-planar surfaces

  • Author

    Lavallee, E. ; Beauvais, J. ; Drouin, D. ; Kelkar, Prasanna ; Yang, P. ; Turcotte, D. ; Cloutier, M. ; Legario, R.

  • Author_Institution
    Electr. Eng., Quantiscript Inc., Sherbrooke, Que., Canada
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    152
  • Lastpage
    153
  • Abstract
    In this paper, the resist is evaporated using conventional thermal evaporation. Thickness as small as 20 nm have been demonstrated, with surface roughness as small as 4 nm rms.
  • Keywords
    electron beam lithography; evaporation; nanolithography; resists; surface roughness; 20 nm; conventional thermal evaporation; electron beam lithography; nonplanar surfaces; resist; surface roughness; Chromium; Electron beams; Fresnel reflection; Lenses; Lithography; Optical fibers; Resists; Rough surfaces; Solvents; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268621
  • Filename
    1268621
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2578986