DocumentCode :
2579030
Title :
A study of effects of deflector position variation on leakage currents in ballistic deflection transistors
Author :
Kaushal, Vikas ; Guarino, Gregg ; Yu, Qiaoyan ; Donaldson, William R. ; Ampadu, Paul ; Sobolewski, Roman ; Margala, Martin
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Massachusetts Lowell, Lowell, MA, USA
fYear :
2009
fDate :
2-5 June 2009
Firstpage :
13
Lastpage :
18
Abstract :
In this paper, leakage mechanisms in ballistic deflection transistors (BDT) are studied using Finite Element Analysis (FEA) based on a simple conductive media model, a BDT simulator based on the semi-classical billiard model, and experimental measurements. In BDT, by simply tailoring the architecture, the electron transport can be, to a large extent, modified and controlled to reduce leakage. Since the triangular deflector plays a significant role in the operation of BDT, the models take into account its position variation along the Y-axis. Experimental results also discuss leakages with the deflector position (DP) variation. Structural modifications in the BDT help in analysing the device functionality, and understanding the relationship between right drain output current (IRD), left drain output current (ILD) and top drain leakage currents (ITD) with device geometry.
Keywords :
ballistics; finite element analysis; leakage currents; transistors; ballistic deflection transistors; conductive media model; deflector position variation; device geometry; finite element analysis; left drain output current (; right drain output current; semi-classical billiard model; top drain leakage currents; triangular deflector; CMOS technology; Cities and towns; Current measurement; Electrons; Geometry; Leakage current; Nanoscale devices; Nanotechnology; Temperature; USA Councils; Ballistic Ttransport; Billiard Model; Comsol Modeling; Deflector; Experiments; Leakage Current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2009. NMDC '09. IEEE
Conference_Location :
Traverse City, MI
Print_ISBN :
978-1-4244-4695-7
Electronic_ISBN :
978-1-4244-4696-4
Type :
conf
DOI :
10.1109/NMDC.2009.5167571
Filename :
5167571
Link To Document :
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