• DocumentCode
    2579030
  • Title

    A study of effects of deflector position variation on leakage currents in ballistic deflection transistors

  • Author

    Kaushal, Vikas ; Guarino, Gregg ; Yu, Qiaoyan ; Donaldson, William R. ; Ampadu, Paul ; Sobolewski, Roman ; Margala, Martin

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Massachusetts Lowell, Lowell, MA, USA
  • fYear
    2009
  • fDate
    2-5 June 2009
  • Firstpage
    13
  • Lastpage
    18
  • Abstract
    In this paper, leakage mechanisms in ballistic deflection transistors (BDT) are studied using Finite Element Analysis (FEA) based on a simple conductive media model, a BDT simulator based on the semi-classical billiard model, and experimental measurements. In BDT, by simply tailoring the architecture, the electron transport can be, to a large extent, modified and controlled to reduce leakage. Since the triangular deflector plays a significant role in the operation of BDT, the models take into account its position variation along the Y-axis. Experimental results also discuss leakages with the deflector position (DP) variation. Structural modifications in the BDT help in analysing the device functionality, and understanding the relationship between right drain output current (IRD), left drain output current (ILD) and top drain leakage currents (ITD) with device geometry.
  • Keywords
    ballistics; finite element analysis; leakage currents; transistors; ballistic deflection transistors; conductive media model; deflector position variation; device geometry; finite element analysis; left drain output current (; right drain output current; semi-classical billiard model; top drain leakage currents; triangular deflector; CMOS technology; Cities and towns; Current measurement; Electrons; Geometry; Leakage current; Nanoscale devices; Nanotechnology; Temperature; USA Councils; Ballistic Ttransport; Billiard Model; Comsol Modeling; Deflector; Experiments; Leakage Current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2009. NMDC '09. IEEE
  • Conference_Location
    Traverse City, MI
  • Print_ISBN
    978-1-4244-4695-7
  • Electronic_ISBN
    978-1-4244-4696-4
  • Type

    conf

  • DOI
    10.1109/NMDC.2009.5167571
  • Filename
    5167571