DocumentCode :
2579170
Title :
Nanomaterials fabrication using advanced thin film deposition and nanohybrid process
Author :
Kim, Hyungjun ; Lee, Han-Bo-Ram ; Kim, Woo-Hee ; Park, Sang-Joon ; Hwang, In Chan
Author_Institution :
Pohang Univ. of Sci. & Technol. (POSTECH), Pohang, South Korea
fYear :
2009
fDate :
2-5 June 2009
Firstpage :
3
Lastpage :
4
Abstract :
With device scaling, the introduction of emerging materials including nanowires and nanodots is required more than ever. We present several examples of making nanomaterials based on advanced thin film deposition techniques including atomic layer deposition, supercritical fluid deposition (SCFD), and selective epitaxial growth (SEG), and nanohybrid process utilizing self-assembled nano-template. Metallic nanomaterials were synthesized by highly conformal ALD Ru and anodic aluminum oxide (AAO) nano-template as well as by spontaneous formation during plasma enhanced ALD Co. Also, using SCFD with high gap fill properties, Ru nanoparticles and RuO2 nanorod were fabricated. Finally, using self-assembled diblock copolymer as a template, ordered array of SiGe nanodots were fabricated by employing SEG.
Keywords :
Ge-Si alloys; aluminium compounds; atomic layer deposition; cobalt; epitaxial growth; nanofabrication; nanostructured materials; plasma materials processing; ruthenium; rutherfordium compounds; self-assembly; semiconductor growth; semiconductor materials; semiconductor quantum dots; Al2O3; Co; Ru; RuO2; SiGe; atomic layer deposition; device scaling; diblock copolymer; emerging materials; metallic nanomaterial fabrication; nanodots; nanohybrid process; nanowires; plasma enhanced ALD; selective epitaxial growth; self-assembled nanotemplate; supercritical fluid deposition; thin film deposition; Aluminum oxide; Atomic layer deposition; Epitaxial growth; Fabrication; Nanomaterials; Nanoscale devices; Nanowires; Plasma properties; Self-assembly; Sputtering; ALD; SCFD; SEG; nanotemplate;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2009. NMDC '09. IEEE
Conference_Location :
Traverse City, MI
Print_ISBN :
978-1-4244-4695-7
Electronic_ISBN :
978-1-4244-4696-4
Type :
conf
DOI :
10.1109/NMDC.2009.5167578
Filename :
5167578
Link To Document :
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