Title :
High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation
Author :
Matsumoto, T. ; Mimura, H.
Author_Institution :
Res. & Dev. Center, Stanley Electr. Co., Yokohama, Japan
Abstract :
Summary form only given. High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation were investigated. We introduce a new nanometer-sized tailored cathode that can be made by simple etching of nano-craters onto a graphite substrate.
Keywords :
X-ray production; cathodes; electron field emission; graphite; nanostructured materials; radiography; sputter etching; C; graphite nanostructure; high density electron emission; high intensity pulse X-ray generation; hydrogen plasma etching; nanocraters etching; nanometer-sized tailored cathode; Cathodes; Electron emission; Electronic mail; Plasma applications; Plasma density; Plasma x-ray sources; Pulse generation; X-ray imaging;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268640
