Title :
Ultra-thin Silicon Nitride Gate Dielectric For Deep-sub-micron CMOS Devices
Author :
Khare, M. ; Xin Guo ; Wang, X.W. ; Ma, T.P. ; Cui, G.J. ; Tamagawa, T. ; Halpern, B.L. ; Schmitt, J.J.
Author_Institution :
Dept. of Electrical Engineering, Yale University, New Haven, CT 06520
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623690
