Fabrication of cylinder type micro channel using photoresist reflow and isotropic etching

Author

Chang-Hyun Bae ; Chang-Taeg Seo ; Jong-Hyun Lee

Author_Institution

Sch. of Electron. & Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea

fYear

2003

fDate

29-31 Oct. 2003

Firstpage

200

Lastpage

201

Abstract

In this paper we have fabricated cylinder type micro channel using photoresist reflow and isotropic etching. Si substrate, using a Si/sub 3/N/sub 4/ (6000/spl Aring/) as a mask, was selectively etched using a HNA etching system for the bottom hemisphere of the channel. Photoresist reflow was used to make the top of the channel round. Then Si/sub 3/N/sub 4/ was deposited on the reflowed photoresist. Since the deposited Si/sub 3/N/sub 4/ was about 6000 /spl Aring/ thick it is possible to see the inside of the channel. This channel is expected to be applied to simple bio and microfluidic devices in which optical detection is needed.

Keywords

etching; masks; microfluidics; photoresists; plasma CVD; silicon compounds; 6000 /spl Aring/; Si; Si substrate; Si/sub 3/N/sub 4/; bio devices; bottom hemisphere; cylinder type microchannel; etching system; isotropic etching; mask; microfluidic devices; photoresist reflow; Biomedical optical imaging; Engine cylinders; Etching; Fabrication; Metallization; Microfluidics; Optical detectors; Optical devices; Resists; Silicon compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-040-2

Type

conf

DOI

10.1109/IMNC.2003.1268707

Filename

1268707