Title :
Ultra-low Resistance Diret~ Contact Cu Via technology Using In-situ Chemical Vapor Cleamng
Author :
Tsuchiya, Y. ; Ueno, K. ; Donnelly, V.M. ; Kikkawa, T. ; Hayashi, Y. ; Kobayashi, A. ; Sekiguchi, A.
Author_Institution :
NEC Corp., 1120, Shimokuzawa, KANAGAWA 229, Japan
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623694
