Shrinking of spin-on-glass films induced by synchrotron radiation and its application to the 3-D microfabrications

Author

Rahman, M.M. ; Tero, R. ; Urisu, T.

Author_Institution

Dept. of Struct. Molecular Sci., Graduate Univ. for Adv. Studies, Okazaki, Japan

fYear

2003

fDate

29-31 Oct. 2003

Firstpage

254

Lastpage

255

Abstract

Spin-on-glass (SOG) is an important material in semiconductor integrated circuit fabrication and widely used for flattering of the inter level dielectrics. Typical thickness of SOG films are hundreds of nanometers. It is usually cured with reducing the thickness by heating to high temperatures in the last stage of the processes. In this paper, we have found that the thickness is also reduced by the irradiation of the synchroton radiation (SR) beam with covering the surface by Co mask. We are considering that this phenomenon is applied to three dimensional microfabrications, the degree of the shrinking depends on the thickness of the mask.

Keywords

X-ray effects; etching; glass; masks; semiconductor technology; shrinkage; thin films; Co mask; shrinking; spin-on-glass films; synchrotron radiation; three dimensional microfabrications; Curing; Dielectric materials; Etching; Fabrication; Heating; Semiconductor films; Semiconductor materials; Strontium; Synchrotron radiation; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-040-2

Type

conf

DOI

10.1109/IMNC.2003.1268742

Filename

1268742