DocumentCode
2581028
Title
Ablation of organic polymers by direct exposure to radiation from a laser plamsa X-ray source
Author
Fiedorowicz, H. ; Bartnik, A. ; Juha, L. ; Krasa, J. ; Kubat, P. ; Mikolajczyk, J. ; Rakowski, R.
Author_Institution
Inst. of Optoelectron., Mil. Univ. of Technol., Warszawa, Poland
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
266
Abstract
Summary form only given. In this paper, we present the first experiments on direct photo-etching of organic polymers using a laser plasma x-ray source based on a laser-irradiated gas puff target.
Keywords
laser ablation; laser beam etching; plasma X-ray sources; polymers; ablation; laser plasma X-ray source; laser-irradiation; organic polymers; photo-etching; Free electron lasers; Gas lasers; Laser ablation; Laser theory; Micromachining; Plasma measurements; Plasma sources; Plasma x-ray sources; Polymers; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268748
Filename
1268748
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