DocumentCode
2581041
Title
Incident angle dependence of O/sub 2/ cluster ions on Ta/sub 2/O/sub 5/ thin film properties
Author
Inoue, S. ; Fujiwara, Y. ; Toyoda, N. ; Yamada, I. ; Tsubakino, H.
Author_Institution
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
268
Lastpage
269
Abstract
In this paper, the incident angle dependence of assisting O/sub 2/ cluster ion beams for various film properties was reported. Surface roughness and AFM image of Ta/sub 2/O/sub 5/ films was shown.
Keywords
atomic force microscopy; dielectric thin films; ion beam effects; surface morphology; surface roughness; tantalum compounds; 200 nm; AFM image; O/sub 2/ cluster ions; Ta/sub 2/O/sub 5/; Ta/sub 2/O/sub 5/ thin film properties; incident angle; surface roughness; Atomic layer deposition; Ion beams; Optical films; Optical microscopy; Optical surface waves; Rough surfaces; Sputtering; Surface morphology; Surface roughness; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268749
Filename
1268749
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