Title :
Progress of a laser-produced-plasma light source for EUV lithography
Author :
Komori, H. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Soumagne, G. ; Takabayashi, Y. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K. ; Horiike, Y.
Author_Institution :
Hiratsuka Res. Center, Extreme Ultraviolet Lithography Syst. Dev. Assoc., Kanagawa, Japan
Abstract :
Summary form only given. Extreme Ultraviolet Lithography (EUVL) is a major candidate of next generation lithography (NGL) technology for the fabrication of 45 nm node and below. In this paper, we report the laser produced plasma EUV light source development status.
Keywords :
plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; 45 nm; EUV lithography; extreme ultraviolet lithography; laser-produced-plasma light source; Light sources; Lithography; Optical pulses; Oscillators; Power generation; Power lasers; Space vector pulse width modulation; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268753
